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Film Thickness Measuring Instrument Product List

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Insulated fastener "TermoZ CS ii 8 Termoz"

Economical and strong screw fastening for insulation materials.

◆Applicable Base Materials - European Technical Assessment Base Material Classification (Normal Concrete, Solid Brick, Hollow Brick, Lightweight Concrete, ALC) - Normal Concrete - Concrete (Shell Structure) - Building Brick - Solid Limestone Brick - Lightweight Concrete Hollow Block - Vertical Hole Brick - Perforated Limestone Brick - Lightweight Aggregate Concrete - ALC, etc. ◆Functions - On-site matching construction through the drill hole in the insulation material. - Seat excavation construction using the dedicated tool Setting Tool CS (sold separately). - As an option, use the dedicated tool Setting Tool CS in reverse for flush installation. - When using the dedicated tool Setting Tool CS in reverse, the stop disk is installed flush with the surface of the insulation material. - After seat excavation construction, install the circular cover (sold separately). - No plug cap is required for flush installation. - For sizes of other types TermoZ CS ii 8 DT 110 V, please refer to the separate catalog.

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Mercury Probe CV/IV Measurement Device "MCV Series"

No need for electrode formation with mercury probes! Provides reduced development time and lower costs in R&D.

The "MCV-530/530L/2200/2500" is a device that enables the evaluation of electrical characteristics of semiconductor silicon wafers and the characteristics of MOS device oxide films, among others. Traditionally, gate electrodes such as Poly-Si or Al were deposited on the wafer, and after forming MOS structures or Schottky structures, CV/IV characteristic evaluations were conducted. This product has its own gate electrode, allowing for the acquisition of electrical characteristics of oxide films and wafers without the need to create a metal gate. It provides quick feedback through process monitoring, reduces development time in R&D, and lowers costs. 【Features】 ■ No need for electrode formation due to the mercury probe ■ Excellent reproducibility ・Schottky: 0.3% (1σ) / MOS: 0.1% (1σ) ■ Mapping of the wafer surface is possible ■ Safe and easy mercury exchange enabled by a newly developed mercury exchange mechanism *For more details, please refer to the PDF document or feel free to contact us.

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